Primary Line of Liquid Source from Hong Kong Specialty Gases
Dielectric CVD Liquid Sources:
TEOS, TMP, TMB,TEP, TEB, TEPO, TMPO, DES, TMCTS, TTMSB,TTMSP, Ta Ethoxide and other application specific materials.
Boron Nitride Sources:
Borazine
Conductor CVD Sources:
TiCl4, TEAT, TMAT, Cu^I and Cu^II sources, Al sources, and other molecular-tailored compounds.
Etch & Diffusion Sources:
TCA, POCI3, BBR3, PBr3, CCI4, CHCI3, SiCI4 and others.
Delivery Hardware:
Stainless Steel (SS) ampules, SS 5 gallon canisters, quartz bubblers temperature controllers, bulk chemical delivery cabinets, level sensing systems, manual and auto-refill systems, and other application specific hardware.
HSG Custom Services:
Custom SS and quartz delivery hardware fabrication, custom bulk refill systems, container cleaning, hardware repair and other services.
Dichloromethane (DCM)
Application:
Dichloromethane (DCM) considered as a replacement for Trichloroethane (TCA), which is currently used as a HCI source for oxidation processes. TCA has been identified by the Montreal Protocol and U.S. Clean Air Act as an ozone depleting chemical. This action has prompted semiconductor manufacturers to find a drop-in replacement for TCA without having to return to HCI.
Trans 1,2-Dichloroethylene (DCE)