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Metalorganic Precursors For Chemical Vapour Deposition  

Over many years of experience in supplying ULSI grade arsine & phosphine for chemical vapour deposition (CVD) application has allowed Hong Kong Specialty Gases to expand our product offering for metalorganic precursors. We are continually adding new products for this dynamic & exciting field. Our supplier utilises unique process for the manufacture of Group III sources, such as, TMAI, TMG, TMI and DEZn. This process eliminates oxygen and associated impurities leading to improved device result. Our range of products include:

  • Chemicals for III-V Technology
  • Chemicals for II-VI Technology
  • Dopant Sources / Dopant Mixtures
Hong Kong Specialty Gases also offers all welded electropolished stainless steel bubblers with Nupro® bellows sealed valves. Standard connections are 1/4 inch VCR male. Unique pick up system with dip tube of 1/8 inch norminal bore eusures maximum product utilization. The supplied range of sizes are for the accomodation of 25g to 2kg of product.

The below designs represent two of the more popular types utilized by the industry. Any configuration can be produced to individual customers specification.

Electropolished Stainless Steel Bubblers (Vertical)

 

Electropolished Stainless Steel Bubblers with Fill Port (Horizontal)

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